Technical University of Denmark
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Figures for "SiO2 dry etching by a consumable solid source and He plasma", Plasma Sources Science and Technology

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<p dir="ltr">In this repository one can find the data pertaining the figures in the named journal submission, both high resolution png files of the figures and data used in associated plots.</p><p dir="ltr">Data associated with Figure 4 in txt format.</p><p dir="ltr">Data associated to Figure 5 split in two labelled csv files.</p>

Funding

Development of etch process for high volume 2D transmission gratings

Innovation Fund Denmark

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